William B. Penzes

Electrical Test Structure for Overlay Metrology Referenced to Absolute Length Standards | NIST

Richard A. Allen, Michael W. Cresswell, E. Clayton Teague, 1994 .

Two-dimensional calibration artifact and measurement methodology

Richard M. Silver, Theodore D. Doiron, Michael T. Takac, 1999, Advanced Lithography.

Toward nanometer accuracy measurements

John S. Villarrubia, David E. Gilsinn, E. Clayton Teague, 1999, Advanced Lithography.

THE MOLECULAR MEASURING MACHINE

John S. Villarrubia, E Amatucci, Fredric Scire, 1998 .

The Molecular Measuring Machine | NIST

E C. Teague, E Amatucci, John A. Kramar, 1998 .

A new method to measure the distance between graduation lines on graduated scales

Richard A. Allen, Michael W. Cresswell, E. Clayton Teague, 1999, IEEE Trans. Instrum. Meas..

A new method to measure the distance between graduation lines on graduated scales

Richard A. Allen, Michael W. Cresswell, E. Clayton Teague, 2000, IEEE Trans. Instrum. Meas..

Grating pitch measurements with the molecular measuring machine

John S. Villarrubia, E C. Teague, John A. Kramar, 1999, Optics & Photonics.

Test structure for the in-plane locations of project features with nanometer-level accuracy traceable to a coordinate measurement system

Loren W. Linholm, E. C. Teague, M. W. Cresswell, 1993, ICMTS 93 Proceedings of the 1993 International Conference on Microelectronic Test Structures.

Hybrid optical-electrical overlay test structure

M. W. Cresswell, R. A. Allen, Loren W. Linholm, 1997 .