Shye Lin Wu

Enhancement of oxide break-up by implantation of fluorine in poly-Si emitter contacted p/sup +/-n shallow junction formation

Tan Fu Lei, Chung Len Lee, L. Chen, 1994, IEEE Electron Device Letters.

Suppression of the boron penetration induced Si/SiO/sub 2/ interface degradation by using a stacked-amorphous-silicon film as the gate structure for pMOSFET

Tan Fu Lei, Chung Len Lee, L. Chen, 1994, IEEE Electron Device Letters.