N. Shigeeda

Complete planarization of via holes with aluminum by selective and nonselective chemical vapor deposition

Kazuya Masu, Kazuo Tsubouchi, Nobuo Mikoshiba, 1990 .

Selective and nonselective deposition of aluminum by LPCVD using DMAH and microregion observation of single crystal aluminum with scanning μ-RHEED microscope

T. Matano, K. Masu, K. Tsubouchi, 1990, Digest of Technical Papers.1990 Symposium on VLSI Technology.

Selective deposition of aluminum from selectively excited metalorganic source by the rf plasma

Kazuya Masu, Kazuo Tsubouchi, Nobuo Mikoshiba, 1990 .