Vinayan C. Menon

Overlay improvement roadmap: strategies for scanner control and product disposition for 5-nm overlay

Nelson Felix, Scott Halle, Allen H. Gabor, 2011, Advanced Lithography.

High-order wafer alignment in manufacturing

Nelson Felix, Christopher P. Ausschnitt, Michael Pike, 2012, Advanced Lithography.

Implementation of integrated auto macro-defect inspection in the photolithography tool cluster

Vinayan C. Menon, Richard E. Lewis, Vandana Vishnu, 2005, SPIE Advanced Lithography.

Characterization and mitigation of overlay error on silicon wafers with nonuniform stress

Nelson Felix, Pradeep Vukkadala, Sathish Veeraraghavan, 2014, Advanced Lithography.

Determining DOF requirements needed to meet technology process assumptions

Timothy A. Brunner, Allen H. Gabor, Shailendra Mishra, 2008, SPIE Advanced Lithography.

Optimization of an integrated and automated macro inspection system for the utilization of wafer color variation detection in a photolithography cluster

David S. Dixon, Robert L. Isaacson, Vinayan C. Menon, 2006, SPIE Advanced Lithography.

Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress

Nelson Felix, Christopher P. Ausschnitt, Pradeep Vukkadala, 2013 .

Product and tool control using integrated auto-macro defect inspection in the photolithography cluster

Robert L. Isaacson, Vinayan C. Menon, Stephen J. Lickteig, 2006, SPIE Advanced Lithography.