Dhairya Dixit

Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes

Alok Vaid, Dhairya Dixit, Nick Keller, 2018 .

Optical CD metrology for directed self-assembly assisted contact hole shrink process

Moshe Preil, Erik R. Hosler, Jun Sung Chun, 2015, Advanced Lithography.

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Moshe Preil, Gangadhara Raja Muthinti, Abhishek Gottipati, 2015 .

Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm

Alok Vaid, Eric P. Solecky, Dhairya Dixit, 2017, ASMC 2017.

Metrology manufacturing control factors: A holistic approach for supporting 14nm and 7nm

Alok Vaid, Eric Solecky, Dhairya Dixit, 2017, 2017 40th International Convention on Information and Communication Technology, Electronics and Microelectronics (MIPRO).

Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

Moshe Preil, Alain C. Diebold, Gangadhara Raja Muthinti, 2015, Advanced Lithography.

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

Warren Montgomery, Moshe E. Preil, Erik R. Hosler, 2016 .

Advanced applications of scatterometry based optical metrology

Alok Vaid, Dhairya Dixit, Nick Keller, 2017, Advanced Lithography.

Spectroscopic ellipsometry studies of 3-stage deposition of CuIn1-xGaxSe2 on Mo-coated glass and stainless steel substrates

Pradeep Haldar, Alain C. Diebold, Robert W. Collins, 2016 .

Optical Metrology for Directed Self-assembly Patterning Using Mueller Matrix Spectroscopic Ellipsometry Based Scatterometry

Dhairya Dixit, 2015 .