Nick Keller

发表

Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes

Alok Vaid, Dhairya Dixit, Nick Keller, 2018 .

Optical CD metrology for directed self-assembly assisted contact hole shrink process

Moshe Preil, Erik R. Hosler, Jun Sung Chun, 2015, Advanced Lithography.

Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology

Moshe Preil, Gangadhara Raja Muthinti, Abhishek Gottipati, 2015 .

Optical characterization of multi-NST nanowire test structures using Mueller matrix spectroscopic ellipsometry (MMSE) based scatterometry for sub 5nm nodes

Aelan Mosden, Nick Keller, Madhulika S. Korde, 2019, Advanced Lithography.

Modeling ellipsometric measurement of three-dimensional structures with rigorous coupled wave analysis and finite element method simulations

Nick Keller, Samuel O’Mullane, Alain C. Diebold, 2016 .

Modeling ellipsometric measurement of novel 3D structures with RCWA and FEM simulations

Alain C. Diebold, Nick Keller, Samuel O'Mullane, 2016, SPIE Advanced Lithography.

X-ray metrology of nanowire/ nanosheet FETs for advanced technology nodes

Alain C. Diebold, Daniel F. Sunday, Subhadeep Kal, 2020, Advanced Lithography.

Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry

Moshe Preil, Alain C. Diebold, Gangadhara Raja Muthinti, 2015, Advanced Lithography.

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

Warren Montgomery, Moshe E. Preil, Erik R. Hosler, 2016 .

Advanced applications of scatterometry based optical metrology

Alok Vaid, Dhairya Dixit, Nick Keller, 2017, Advanced Lithography.

Scatterometric analysis of a plasmonic test structure

Brian Martinick, Nick Keller, Joseph Race, 2015, Advanced Lithography.

Scatterometry of nanowire/nanosheet FETs for advanced technology nodes

Alain C. Diebold, Subhadeep Kal, Aelan Mosden, 2021, Advanced Lithography.

Ellipsometric critical dimension metrology employing mid-infrared wavelengths for high-aspect-ratio channel hole module etch processes

Nick Keller, Troy Ribaudo, Biow Hiem Ong, 2021, Advanced Lithography.

Enhancing one dimensional sensitivity with plasmonic coupling.

Nick Keller, Joseph Race, Samuel O'Mullane, 2014, Optics express.

Perspective: Optical measurement of feature dimensions and shapes by scatterometry

Alain C. Diebold, Nick Keller, A. Diebold, 2018 .