Markus Mengel

The impact of projection lens polarization properties on lithographic process at hyper-NA

Michael Totzeck, Emil Schmitt-Weaver, Bernd Geh, 2007, SPIE Advanced Lithography.

Update on the SEMATECH 0.5 NA Extreme-Ultraviolet Lithography (EUVL) Microfield Exposure Tool (MET)

Dominic Ashworth, Regina Soufli, Michael Goldstein, 2014, Advanced Lithography.

Clean focus, dose and CD metrology for CD uniformity improvement

Sangjun Han, Honggoo Lee, John C. Robinson, 2018, Advanced Lithography.