Jens Ringling

Development of high-power EUV sources for lithography

Vladimir M. Borisov, Guido Schriever, Juergen Kleinschmidt, 2002, SPIE Advanced Lithography.

High-power-gas-discharge- and laser-plasma-based EUV sources

Uwe Stamm, Guido Schriever, Juergen Kleinschmidt, 2002, SPIE LASE.

High-power EUV sources for lithography: a comparison of laser-produced plasma and gas-discharge-produced plasma

Uwe Stamm, Guido Schriever, Juergen Kleinschmidt, 2002, SPIE Advanced Lithography.

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2003, SPIE Advanced Lithography.

High-power sources for EUV lithography: state of the art

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2004, SPIE High-Power Laser Ablation.

EUV source power and lifetime: the most critical issues for EUV lithography

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2004, SPIE Advanced Lithography.