F. Ho

High frequency attenuated total internal reflection light modulator

J. I. Thackara, Olav Solgaard, David M. Bloom, 1992 .

Laser‐assisted chemical etching of copper

J. Hurst, J. Ritsko, F. Ho, 1988 .

XeCl laser controlled chemical etching of aluminum in chlorine gas

G. Koren, J. Ritsko, F. Ho, 1986 .