Chi-Lin Mo

Inhibitor-Free Area-Selective Atomic Layer Deposition with Feature Size Down to Nearly 10 nm

Cheng-Hung Hou, J. Shyue, Chih-Piao Chuu, 2023, Chemistry of Materials.

Impact of monolayer engineering on ferroelectricity of sub-5 nm Hf0.5Zr0.5O2 thin films

Chun-Yi Chou, Miin-Jang Chen, Chi-Lin Mo, 2023, Acta Materialia.

Atomic layer engineering on resistive switching in sub-4 nm AlN resistive random access memory devices

J. Shyue, C. Ling, Miin-Jang Chen, 2023, Journal of Materials Chemistry C.