James Word

Machine learning based wafer defect detection

Qian Xie, Feng Wang, Yuansheng Ma, 2019, Advanced Lithography.

Characterization and mitigation of relative edge placement errors (rEPE) in full-chip computational lithography

Shumay Shang, John Sturtevant, James Word, 2015, SPIE Photomask Technology.

Effective model-based SRAF placement for full chip 2D layouts

Pat LaCour, Alexander Tritchkov, Srividya Jayaram, 2013, Advanced Lithography.

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Neal Lafferty, Germain Fenger, Yuansheng Ma, 2015, Advanced Lithography.

Advanced layout fragmentation and simulation schemes for model-based OPCC

Pat LaCour, James Word, Andres Torres, 2004, SPIE Advanced Lithography.

Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning

Yan Wang, Joydeep Mitra, Germain Fenger, 2016, SPIE Advanced Lithography.