Nacer Zine El Abidine

Accurate mask model implementation in OPC model for 14nm nodes and beyond

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2015, SPIE Photomask Technology.

Accurate mask model for advanced nodes

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2014, Photomask and Next Generation Lithography Mask Technology.

Accurate mask model implementation in optical proximity correction model for 14-nm nodes and beyond

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2016 .