Peter Buck

Accurate mask model implementation in OPC model for 14nm nodes and beyond

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2015, SPIE Photomask Technology.

Accurate mask model for advanced nodes

Isabelle Schanen, Frank Sundermann, Ingo Bork, 2014, Photomask and Next Generation Lithography Mask Technology.

Pattern fidelity performance from next-generation DUV laser lithography on 65nm masks and wafers

Michael White, Vishal Garg, Paul C. Allen, 2005, SPIE Photomask Technology.

Golden curve method for OPC signature stability control in high MEEF applications

Martin Sczyrba, Russell Cinque, Engelbert Mittermeier, 2007, SPIE Advanced Lithography.

Using curvature-based pre-bias to reduce number of iterations in curvilinear mask process correction

Peter Buck, Bhardwaj Durvasula, Ingo Bork, 2021, Photomask Technology.

A study on various curvilinear data representations and their impact on mask manufacturing flow

Sandeep Koranne, Alexander Tritchkov, Ravi Pai, 2021, Advanced Lithography.

Curvature based fragmentation for curvilinear mask process correction

Nageswara Rao, Peter Buck, Bhardwaj Durvasula, 2021, Photomask Technology.

Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications

Peter Buck, Kushlendra Mishra, Ingo Bork, 2021, Photomask Technology.