Jochem Janssen

Increased particle inspection sensitivity by reduction of background scatter variance

Richard Versluis, Diederik J. Maas, Peter van der Walle, 2013, Advanced Lithography.

EBL2 an EUV (Extreme Ultra-Violet) lithography beam line irradiation facility

Freek Molkenboer, Jochem Janssen, Jetske Stortelder, 2019, Photomask Technology.

Nanoparticle detection limits of TNO's Rapid Nano: modeling and experimental results

Diederik J. Maas, Peter van der Walle, Pragati Kumar, 2012, Photomask Technology.