K. Kwon

All-Sputter-Deposited Hf0.5Zr0.5O2 Double-Gate Ferroelectric Thin-Film Transistor With Amorphous Indium–Gallium–Zinc Oxide Channel

Sangwoo Kim, Rino Choi, Jiyong Yim, 2023, IEEE Electron Device Letters.

Effects of oxygen vacancies on ferroelectric characteristics of RF-sputtered Hf0.5Zr0.5O2

Sangwoo Kim, Jiyong Yim, Dae-Hun Kwon, 2023, Materials Science in Semiconductor Processing.

Ferroelectric Polarization-Switching Acceleration of Sputtered Hf0.5zr0.5o2 with Defect-Induced Polarization of Interlayer

An Hoang-Thuy Nguyen, Sangwoo Kim, Rino Choi, 2023, SSRN Electronic Journal.