Anindarupa Chunder

发表

Study of cut mask lithography options for sub-20nm metal routing

Chenchen Wang, Yan Wang, Jongwook Kye, 2015, Advanced Lithography.

Optimization of stochastic EUV resist models parameters to mitigate line edge roughness

John J. Biafore, Harry J. Levinson, Azat Latypov, 2017, Advanced Lithography.

Systematic assessment of the contributors of line edge roughness in EUV lithography using simulations

John J. Biafore, Harry J. Levinson, Azat Latypov, 2018, Advanced Lithography.

Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations

John J. Biafore, Harry J. Levinson, Azat Latypov, 2017, Advanced Lithography.

Conformal switchable superhydrophobic/hydrophilic surfaces for microscale flow control

Lei Zhai, Hyoung J. Cho, Anindarupa Chunder, 2009 .

Synthesis and Characterization of Polycarbonate-containing All-organic High-χ Block Copolymers for Directed Self-assembly

Joy Cheng, Daniel P. Sanders, Teddie Magbitang, 2015 .

Microfluidic valves based on superhydrophobic nanostructures and switchable thermosensitive surface for lab-on-a-chip (LOC) systems

Lei Zhai, Hyoung J. Cho, Anindarupa Chunder, 2008 .

Development of polycarbonate-containing block copolymers for thin film self-assembly applications

Alshakim Nelson, Joy Cheng, Daniel P. Sanders, 2016 .

Directed Self-assembly of Topcoat-free, Integration-friendly High-χ Block Copolymers

Joy Cheng, Guanyang Lin, Daniel P. Sanders, 2014 .