Lay Cheng Choo

Optimization of DUV photolithography for sub-250-nm technology: contact patterning with attenuated phase-shift mask

Siu Chung Tam, Alex Tsun-Lung Cheng, Lay Cheng Choo, 1998, Advanced Lithography.

Design considerations of IRST system

Meng Hwa Er, Ronda Venkateswarlu, Choong Wah Chan, 1997, Defense, Security, and Sensing.

Application of attenuated phase-shifting masks to sub-130-nm lithography

Qunying Lin, Siu Chung Tam, Lay Cheng Choo, 2001, SPIE Advanced Lithography.