J. McNamara

Review of four novel dosimeters developed for use in radiotherapy

P. Metcalfe, N. Hardcastle, I. Fuduli, 2013 .

Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography

Gijsbert Rispens, Bernhard Kneer, Jan van Schoot, 2017, Photomask Technology.

Illumination source optimization in EUV lithography for staggered contact holes and pillars for DRAM applications

Gijsbert Rispens, Chang-Moon Lim, Chang-Nam Ahn, 2018, Advanced Lithography.

EUV source optimization driven by fundamental diffraction considerations

Jo Finders, Paul van Adrichem, Eelco van Setten, 2017, Photomask Technology.