Eun-Joo Lee

Chemical Vapor Deposition of HfO2 Thin Films Using the Novel Single Precursor Hafnium 3-Methyl-3-pentoxide, Hf(mp)4

K. An, Taek-seung Yang, Nam-Soo Lee, 2005 .

Atomic Layer Deposition of La2O3 Thin Films by Using an Electron Cyclotron Resonance Plasma Source

Y. Jeon, Jong-Wan Park, B. Kim, 2006 .

Lanthanum-oxide thin films deposited by plasma-enhanced atomic layer deposition

Jong-Wan Park, Sang-kyun Park, B. Kim, 2006 .