Kosuke Shobatake

Photodissociation dynamics of ethylene sulfide and allene at 193 nm studied by time-of-flight mass spectroscopy

Kiyohiko Tabayashi, Kosuke Shobatake, 1992, Photonics West - Lasers and Applications in Science and Engineering.

Energy transfer in hyperthermal Xe-graphite surface scattering

Hiroki Yamaguchi, Yoichiro Matsumoto, Shigeo Maruyama, 2006 .

Characterization of silica glasses sintered under Cl2 ambients

Hiroshi Kawazoe, Koichi Awazu, Kiyohiko Tabayashi, 1991 .

Synchrotron radiation‐excited etching of SiO2 with SF6 at 143 and 251 Å using undulator radiation

Nobuo Hayasaka, Haruhiko Ohashi, H. Kume, 1990 .

Photodissociative excitation processes of XeF2 in the vacuum ultraviolet region 105–180 nm

Kosuke Shobatake, Mitsuhiko Kono, K. Shobatake, 1995 .