ChungHsi J. Wu

Defect printing issues with high-contrast chemically amplified resists

Alan C. Thomas, George M. Jordhamo, Zhijian G. Lu, 2000, Advanced Lithography.

High-NA swing curve effects

Timothy A. Brunner, Allen H. Gabor, ChungHsi J. Wu, 2001, SPIE Advanced Lithography.

Scattered light: the increasing problem for 193-nm exposure tools and beyond

Kafai Lai, Christopher J. Progler, ChungHsi J. Wu, 2001, SPIE Advanced Lithography.