Trey Graves

Mechanistic simulation of line-edge roughness

Trey Graves, John J. Biafore, Stewart A. Robertson, 2007, SPIE Advanced Lithography.

Gaining insight into effective metrology height through the use of a compact CDSEM model for lithography simulation

Alessandro Vaglio Pret, Trey Graves, Stewart Robertson, 2016, SPIE Advanced Lithography.

The impact of attenuated phase shift mask topography on hyper-NA lithography

Trey Graves, Chris A. Mack, Mark D. Smith, 2005, SPIE Photomask Technology.

Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection

Guy M. Parsey, R. Gronheid, J. Biafore, 2023, Photomask Technology.

DSA graphoepitaxy calibrations for contact hole multiplication

Alessandro Vaglio Pret, Trey Graves, Stewart Robertson, 2015, Advanced Lithography.

Statistical simulation of photoresists at EUV and ArF

James W. Thackeray, Trey Graves, David Blankenship, 2009, Advanced Lithography.