Katsuhiro Takushima

Fogging effect compensation technique for photomask making

Yuji Nozaki, Toshiyuki Tanaka, Katsuhiro Takushima, 2000, Photomask Japan.

Continous phase transitions fabricated by subtractive process

Katsuhiro Takushima, Yoshio Tanaka, Taro Saito, 1994, Photomask Technology.

Application of conventional defect repair technique to phase-shifting masks

Katsuhiro Takushima, Yoshio Tanaka, Taro Saito, 1994, Photomask and Next Generation Lithography Mask Technology.