C. Bouet

Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application

M. Argoud, N. Possémé, R. Tiron, 2021, Journal of Vacuum Science & Technology B.

Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

K. Benotmane, X. Chevalier, C. Nicolet, 2020, Advanced Lithography.