Karen Turnquest

发表

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

Vivek M. Prabhu, Bryan D. Vogt, Eric K. Lin, 2007, SPIE Advanced Lithography.

Performance of a dry 193nm resist under wet conditions

Munirathna Padmanaban, Ralph R. Dammel, Dalil Rahman, 2006, SPIE Advanced Lithography.

Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Vivek M. Prabhu, Bryan D. Vogt, Eric K. Lin, 2006, SPIE Advanced Lithography.

Direct measurement of the in-situ developed latent image: the residual swelling fraction

Vivek M. Prabhu, Bryan D. Vogt, Eric K. Lin, 2007, SPIE Advanced Lithography.

The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists

Ashwin Rao, Wen-li Wu, Vivek M. Prabhu, 2006, SPIE Advanced Lithography.

Dissolution fundamentals of 193-nm methacrylate based photoresists

Ashwin Rao, William D. Hinsberg, Vivek M. Prabhu, 2006, SPIE Advanced Lithography.

FTIR measurements of compositional heterogeneities

Ashwin Rao, Shuhui Kang, Karen Turnquest, 2007, SPIE Advanced Lithography.

Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?

Kim Dean, Shashikant Patel, Karen Turnquest, 2004, SPIE Advanced Lithography.

Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2006 .

Influence of base additives on the reaction diffusion front of model chemically amplified photoresists

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2007 .

Characterization of Compositional Heterogeneity in Chemically Amplified Photoresist Polymer Thin Films with Infrared Spectroscopy

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2007 .

Measurements of the Reaction-Diffusion Front of Model Chemically Amplified Photoresists with Varying Photoacid Size |

Wen-li Wu, Vivek M. Prabhu, Bryan D. Vogt, 2006 .