J. Peter Krusius

High Resolution Trilayer Electron Beam Resist System Employing P[Mma/Maa] And Reliable Reactive Ion Etch Processes

Asanga H. Perera, Thomas C. Mele, J. Peter Krusius, 1988, Medical Imaging.

System interconnection of high-density multichip modules

J. Peter Krusius, 1991 .

Novel through-die connections for MEMS applications

Wayne Woods, J. Peter Krusius, Swaroop Kommera, 2003, SPIE MOEMS-MEMS.

System-9: a new positive tone novalac-based high-resolution electron-beam resist

Asanga H. Perera, J. Peter Krusius, 1990, Advanced Lithography.

Correction to “1997 list of reviewers”

J. Peter Krusius, 1998 .