Hans Kattouw

Performance of a 1.35NA ArF immersion lithography system for 40-nm applications

Tilmann Heil, Eelco van Setten, Christian Wagner, 2007, SPIE Advanced Lithography.

Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node

Geert Vandenberghe, Staf Verhaegen, Mircea Dusa, 2007, SPIE Advanced Lithography.

Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness

Noel Poduje, Jaydeep Sinha, Youri van Dommelen, 2004, SPIE Advanced Lithography.