Vincent W. Tsai

Toward accurate linewidth metrology using atomic force microscopy and tip characterization

Neal T. Sullivan, Jason Schneir, Saleem H. Zaidi, 1996, Advanced Lithography.

Progress on accurate metrology of pitch, height, roughness, and width artifacts using an atomic force microscope

John S. Villarrubia, Jason Schneir, Ellen D. Williams, 1995, Advanced Lithography.

Measurement of pitch and width samples with the NIST calibrated atomic force microscope

Theodore V. Vorburger, Joseph Fu, Ronald G. Dixson, 1998, Advanced Lithography.

Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology

Neal T. Sullivan, Jason Schneir, Michael Young, 1996, Advanced Lithography.