Efrain Altamirano Sanchez

Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

Gian Francesco Lorusso, Takeyoshi Ohashi, Osamu Inoue, 2016, SPIE Advanced Lithography.

Innovative scatterometry approach for self-aligned quadruple patterning (SAQP) process control

Efrain Altamirano Sanchez, Philippe Leray, Shay Wolfling, 2016, SPIE Advanced Lithography.

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Timon Fliervoet, Mireille Maenhoudt, 2009, Advanced Lithography.

Precuring implant photoresists for shrink and patterning control

Monique Ercken, Efrain Altamirano Sanchez, Gustaf Winroth, 2013, Advanced Lithography.

Impact of post-litho LWR smoothing processes on the post-etch patterning result

Alessandro Vaglio Pret, Philippe Foubert, Efrain Altamirano Sanchez, 2011, Advanced Lithography.