Christoph Hennerkes

A method for predicting at least one lighting parameter for evaluating an illumination settings and procedures for optimizing an illumination settings

Jörg Zimmermann, Ralf Gehrke, Christoph Hennerkes, 2014 .

Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process

Scott Halle, Bernhard Kneer, Emily Gallagher, 2009, Advanced Lithography.

Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners

Oscar Noordman, Andre Engelen, Bernd Geh, 2010, Advanced Lithography.

EUV source-mask optimization for 7nm node and beyond

Paul van Adrichem, Thijs Hollink, Stephen Hsu, 2014, Advanced Lithography.

Statistical analysis of the impact of 2D reticle variability on wafer variability in advanced EUV nodes using large-scale Monte Carlo simulations

Paul van Adrichem, Tom Wallow, Cyrus Tabery, 2021, Advanced Lithography.