T. Yabu

Development of high-power ArF/F2 laser platform for VUV microlithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

Studies of Photoionization Processes of Gas Mixtures for Excimer Laser Discharges

Mitsuo Maeda, Tatsuo Okada, Katsunori Muraoka, 1999 .

Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM

Georg Soumagne, Tsuyoshi Yamada, Takashi Suganuma, 2021, Photomask Technology.