Marc Boonman

Performance of a high-productivity 300-mm dual-stage 193-nm 0.75-NA TWINSCAN AT:1100B system for 100-nm applications

Rian Rubingh, Youri van Dommelen, Sjef Tempelaars, 2002, SPIE Advanced Lithography.

Performance results of a new generation of 300-mm lithography systems

Marc Boonman, Leon Levasier, Tom Castenmiller, 2001, SPIE Advanced Lithography.

The performance advantages of a dual-stage system

John Zimmerman, Sjef Tempelaars, Marc Boonman, 2004, SPIE Advanced Lithography.

Study of the influence of substrate topography on the focusing performance of advanced lithography scanners

Bruno M. La Fontaine, Harry J. Levinson, Anita Fumar-Pici, 2003, SPIE Advanced Lithography.

Approaching new metrics for wafer flatness: an investigation of the lithographic consequences of wafer non-flatness

Noel Poduje, Jaydeep Sinha, Youri van Dommelen, 2004, SPIE Advanced Lithography.

Performance of a high productivity 300 mm dual stage 193 nm 0.75 NA TWINSCAN AT:1100B system for 100 nm applications

Rian Rubingh, Sjef Tempelaars, Marc Boonman, 2003 .