Bin-Chang Chang

Pattern-dependence optical phase effect on alternating phase shift mask

Tsai-Sheng Gau, Jaw-Jung Shin, Bin-Chang Chang, 2003, Photomask Japan.

Alt-PSM of Contact with Phase Assist Feature for 65-nm Node

Burn Jeng Lin, Tsai-Sheng Gau, Chung-Hsing Chang, 2002, Photomask Technology.

Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Burn J. Lin, Tsai-Sheng Gau, Jaw-Jung Shin, 2004, Photomask Japan.

A 65nm node strained SOI technology with slim spacer

Chenming Hu, Tsai-Sheng Gau, Yee-Chia Yeo, 2003, IEEE International Electron Devices Meeting 2003.

45nm node planar-SOI technology with 0.296 /spl mu/m/sup 2/ 6T-SRAM cell

Chenming Hu, Tsai-Sheng Gau, Jaw-Jung Shin, 2004, Digest of Technical Papers. 2004 Symposium on VLSI Technology, 2004..