Thomas Siefke

发表

Double-sided diffractive photo-mask for sub-500nm resolution proximity i-line mask-aligner lithography

Thomas Käsebier, Uwe D. Zeitner, Ernst-Bernhard Kley, 2015, Advanced Lithography.

Design and fabrication of titanium dioxide wire grid polarizer for the far ultraviolet spectral range

Andreas Tünnermann, Stefanie Kroker, Thomas Siefke, 2016, NanoScience + Engineering.

Mueller matrix ellipsometry for enhanced optical form metrology of sub-lambda structures

Bernd Bodermann, Matthias Wurm, Stefanie Kroker, 2019, Optical Metrology.

Investigation on process induced nano scale shape deviations of DUV tungsten wire grid polarizer

Oliver Puffky, Thomas Siefke, Daniel Voigt, 2014 .

Ellipsometric characterizations of individual nanoform structures

Bernd Bodermann, Matthias Wurm, Stefanie Kroker, 2021, Other Conferences.

Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning.

Andreas Tünnermann, Ernst-Bernhard Kley, Dennis Lehr, 2014, Optics letters.

Line-edge roughness as a challenge for high-performance wire grid polarizers in the far ultraviolet and beyond.

Andreas Tünnermann, Stefanie Kroker, Martin Heusinger, 2018, Optics express.

Materials Pushing the Application Limits of Wire Grid Polarizers further into the Deep Ultraviolet Spectral Range

Adriana Szeghalmi, Ernst-Bernhard Kley, Kay Dietrich, 2016, 1607.04866.

Double-sided structured mask for sub-micron resolution proximity i-line mask-aligner lithography.

Thomas Käsebier, Adriana Szeghalmi, Ernst-Bernhard Kley, 2015, Optics express.