Hiromi Hoshino

发表

Data processing system in electron beam direct writing to obtain photolithography friendly resist patterns

Yasuhide Machida, Hiromi Hoshino, 2007, SPIE Advanced Lithography.

Mask data processing technique using GPU for reducing computer cost

Satoru Asai, Motoshu Miyajima, Tatsuo Chijimatsu, 2011, Photomask Japan.

Model-based lithography verification system for multilayer structure in electron-beam direct writing

Yasuhide Machida, Hiromi Hoshino, Kozo Ogino, 2006, SPIE Advanced Lithography.

Model-based OPC/DRC considering local flare effects

Hiroshi Arimoto, Satoru Asai, Yasuhide Machida, 2004, SPIE Advanced Lithography.

Practical proof of CP element based design for 14nm node and beyond

Makoto Ikeda, Tetsuya Iizuka, Kunihiro Asada, 2013, Advanced Lithography.

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

Akio Yamada, Shinji Sugatani, Yasushi Takahashi, 2012, Advanced Lithography.

CP element based design for 14nm node EBDW high volume manufacturing

Makoto Ikeda, Tetsuya Iizuka, Kunihiro Asada, 2012, Advanced Lithography.

Applying photolithography-friendly design to e-beam direct writing in 65-nm node and beyond

Shinji Sugatani, Takashi Maruyama, Masaaki Miyajima, 2008, SPIE Advanced Lithography.

Proximity effect correction using multilevel area density maps for character projection based electron beam direct writing toward 14 nm node and beyond

Shinji Sugatani, Yasuhide Machida, Takashi Maruyama, 2012, Advanced Lithography.

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshio Ito, Shinji Sugatani, Yasushi Takahashi, 2012, Advanced Lithography.

Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Yoshio Ito, Shinji Sugatani, Yasushi Takahashi, 2012 .