Steven Tottewitz

Topography based wafer clustering for wafer level overlay correction

Sangjun Han, Boris Habets, Stefan Buhl, 2017, Advanced Lithography.

High-order field distortion correction using standalone alignment technology with modeling and sampling optimization

Boris Habets, Haruki Saito, Patrick Lomtscher, 2020, Advanced Lithography.

Understanding overlay signatures using machine learning on non-lithography context information

Boris Habets, Stefan Buhl, Xaver Thrun, 2018, Advanced Lithography.

Intra-field alignment for overlay feed-forward simulation with sampling optimization

Boris Habets, Chun Chi Yu, Martin Freitag, 2019, Advanced Lithography.

Overlay improvement using Legendre-Zernike model-based overlay corrections and monitoring with interpolated metric

Boris Habets, Stefan Buhl, Enrico Bellmann, 2015, Advanced Lithography.

Overlay run-to-run control based on device structure measured overlay in DRAM HVM

Boris Habets, Steven Tottewitz, Patrick Lomtscher, 2019, Advanced Lithography.

Higher order intra-field alignment for intra-wafer lens and reticle heating control

Boris Habets, Charlie Chen, Patrick Lomtscher, 2018, Advanced Lithography.