TS Gau

Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Reinder Plug, Pu Li, Arie den Boef, 2014, Advanced Lithography.

On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Arie den Boef, Maurits van der Schaar, Kaustuve Bhattacharyya, 2013, Advanced Lithography.