Gary Zhang

Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET)

Reinder Plug, Pu Li, Arie den Boef, 2014, Advanced Lithography.

65nm node gate pattern using attenuated phase shift mask with off-axis illumination and sub-resolution assist features

Changan Wang, Mark Mason, Robert A. Soper, 2005, SPIE Advanced Lithography.

Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time, and cost at litho

Vincent Couraudon, Arie den Boef, Youping Zhang, 2015, Advanced Lithography.