Marco A. Zuniga

Application of a general reaction/diffusion resist model to emerging materials with extension to nonactinic exposure

Andrew R. Neureuther, Marco A. Zuniga, Nicholas N. Rau, 1997, Advanced Lithography.

Computer-aided phase shift mask design with reduced complexity

Avideh Zakhor, Yong Liu, Marco A. Zuniga, 1996 .

Efficient simulation of postexposure bake processes in STORM

Mosong Cheng, Ebo H. Croffie, Andrew R. Neureuther, 1999, Advanced Lithography.