Shannon B. Hill

发表

EUV testing of multilayer mirrors: critical issues

Saša Bajt, Pei-Yang Yan, Manish Chandhok, 2006, SPIE Advanced Lithography.

EUV component and system characterization at NIST for the support of extreme-ultraviolet lithography

Robert E. Vest, Thomas B. Lucatorto, Charles S. Tarrio, 2005, SPIE Advanced Lithography.

A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics

Rashi Garg, Lee J. Richter, Robert E. Vest, 2010, Advanced Lithography.

Accelerated lifetime metrology of EUV multilayer mirrors in hydrocarbon environments

Sergiy Yulin, Thomas B. Lucatorto, Charles S. Tarrio, 2008, SPIE Advanced Lithography.

Optics go to extremes in EUV lithography

Thomas B. Lucatorto, Charles S. Tarrio, Steven E. Grantham, 2005 .

Relationship between resist related outgassing and witness sample contamination in the NXE outgas qualification using electrons and EUV

Ivan Pollentier, Roel Gronheid, Thomas B. Lucatorto, 2013, Advanced Lithography.

Effects of varying the parameters in witness-sample-based photoresist outgas testing: dependence of the carbon growth on pumping speed and the dose, time, and area of resist exposure

Thomas B. Lucatorto, Charles S. Tarrio, Steven E. Grantham, 2013, Advanced Lithography.

Complex species and pressure dependence of intensity scaling laws for contamination rates of EUV optics determined by XPS and ellipsometry

Lee J. Richter, Thomas B. Lucatorto, Shannon B. Hill, 2010, Advanced Lithography.

Critical parameters influencing the EUV-induced damage of Ru-capped multilayer mirrors

Ming Fang, Saša Bajt, Manish Chandhok, 2007, SPIE Advanced Lithography.

Measuring the EUV-induced contamination rates of TiO2-capped multilayer optics by anticipated production-environment hydrocarbons

Thomas B. Lucatorto, Charles S. Tarrio, Shannon B. Hill, 2009, Advanced Lithography.

SURF III: A flexible synchrotron radiation source for radiometry and research

Uwe Arp, Robert E. Vest, Thomas B. Lucatorto, 2010 .

Atoms on demand: Fast, deterministic production of single Cr atoms

Jabez J. McClelland, Shannon B. Hill, J. McClelland, 2003 .

EUV Lithography optics contamination and lifetime studies

Thomas B. Lucatorto, Shannon B. Hill, Theodore E. Madey, 2010 .

Saturation effects in solid-state photodiodes and impact on EUVL pulse energy measurements

Robert E. Vest, Steven E. Grantham, Shannon B. Hill, 2006 .

Resonance effects in photoemission from TiO2-capped Mo/Si multilayer mirrors for extreme ultraviolet applications

Thomas B. Lucatorto, Steven E. Grantham, Jeffrey W. Keister, 2011 .