R. Nishio

Origins of charged particles in vapor generated by electron‐beam evaporation

Kazumichi Suzuki, Ryoji Nishio, K. Suzuki, 1992 .

High-temperature electrostatic chuck for nonvolatile materials dry etch

K. Yoshioka, T. Shimada, Saburo Kanai, 2005 .

A Novel Plasma Etching Tool with RF-Biased Faraday-Shield Technology: Chamber Surface Reaction Control in the Etching of Nonvolatile Materials

N. Mise, H. Kazumi, A. Doi, 2003 .