Hideaki Isobe

Evaluation of CP shape correction for e-beam writing

Akio Yamada, Masahiro Takizawa, Keita Bunya, 2012, Photomask Technology.

Complementary patterning demonstration with e-beam direct writer and spacer DP process of 11nm node

Kenichi Oyama, Shohei Yamauchi, Akio Yamada, 2012, Advanced Lithography.

Optimization of chemically amplified resist for high-volume manufacturing by electron-beam direct writing toward 14nm node and beyond

Akio Yamada, Shinji Sugatani, Yasushi Takahashi, 2012, Advanced Lithography.

EB resolution capability with CP exposure

Naoya Hayashi, Kenji Abe, Hiroshi Fujita, 2011, Photomask Japan.

CD error budget of CP exposure

Akio Yamada, Masahiro Takizawa, Keita Bunya, 2011, Photomask Technology.