Takahito Kumazaki

发表

High-range laser bandwidth tuning for focus drilling

Alena Andryzhyieuskaya, John van Keulen, Tom van der Hoeff, 2011, Optical Systems Design.

Development of high-power ArF/F2 laser platform for VUV microlithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

Laser-induced damage and defect analysis of calcium fluoride window caused by the high pulse repetition rate of ArF excimer laser radiation

Takahito Kumazaki, Junichi Fujimoto, Hakaru Mizoguchi, 2018, Laser Damage.

Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

The next-generation ArF excimer laser for multiple-patterning immersion lithography with helium free operation

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2016, Advanced Lithography.

Beam quality of a new-type MOPO laser system for VUV laser lithography

Tatsuya Ariga, Hakaru Mizoguchi, Akira Sumitani, 2004, SPIE Advanced Lithography.

A reliable higher power ArF laser with advanced functionality for immersion lithography

Takahito Kumazaki, Junichi Fujimoto, Shinji Okazaki, 2012, Advanced Lithography.

The ArF laser for the next-generation multiple-patterning immersion lithography supporting green operations

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2016, Advanced Lithography.

The ArF laser for the next generation multiple-patterning immersion lithography supporting green operations and leading edge processes

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2017, Advanced Lithography.

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2015, Advanced Lithography.

Advanced spectral engineering: Lithography performance improvements by high performance light source

Takahito Kumazaki, Toshihiro Oga, Hakaru Mizoguchi, 2020 .

Power up: 120 Watt injection-locked ArF excimer laser required for both multi-patterning and 450 mm wafer lithography

Takahito Kumazaki, Takeshi Asayama, Takashi Matsunaga, 2013, Advanced Lithography.

Extremely long life and low-cost 193nm excimer laser chamber technology for 450mm wafer multipatterning lithography

Takahito Kumazaki, Takeshi Asayama, Takashi Matsunaga, 2014, Advanced Lithography.

Reliable high power injection locked 6 kHz 60W laser for ArF immersion lithography

Takahito Kumazaki, Satoshi Tanaka, Junichi Fujimoto, 2008, SPIE Advanced Lithography.

Spectral metrologies for ultra-line-narrowed F2 laser

Tatsuya Ariga, Hakaru Mizoguchi, Toru Suzuki, 2002, SPIE Advanced Lithography.

Green solution: 120W ArF immersion light source supporting the next-generation multiple-pattering lithography

Takahito Kumazaki, Keisuke Ishida, Takashi Matsunaga, 2015, Advanced Lithography.

Development of the next-generation ArF excimer laser with ultra-narrow stable spectral bandwidth for multiple patterning immersion lithography

Takahito Kumazaki, Takashi Matsunaga, Hakaru Mizoguchi, 2017, Advanced Lithography.

Development of a 5-kHz ultra-line-narrowed F2 laser for dioptric projection systems

Tatsuya Ariga, Takashi Suganuma, Takahito Kumazaki, 2002, SPIE Advanced Lithography.

Laser-induced damage threshold by high pulse repetition rate ArF excimer laser radiation

Takahito Kumazaki, Junichi Fujimoto, Hakaru Mizoguchi, 2019, Laser Damage.

Optical performance of laser light source for ArF immersion double patterning lithography tool

Satoshi Tanaka, Takahito Kumazaki, Junichi Fujimoto, 2009, Advanced Lithography.

Extremely long life excimer laser technology for multi-patterning lithography

Takahito Kumazaki, Takeshi Asayama, Hakaru Mizoguchi, 2018, Advanced Lithography.

Technology for monitoring shot-level light source performance data to achieve high-optimization of lithography processes

Masato Moriya, Takahito Kumazaki, Keisuke Ishida, 2014, Advanced Lithography.

Advanced spectral engineering: a new way of process improvements by laser spectra optimization for optical lithography

Takahito Kumazaki, Toshihiro Oga, Taku Yamazaki, 2021, Advanced Lithography.