Paul B. Mirkarimi

Overcoming substrate defect decoration effects in EUVL mask blank development

Andy Ma, Patrick A. Kearney, Rajul V. Randive, 2004, SPIE Photomask Technology.

Current status of next-generation EUVL mask blank tool development

Andy Ma, Patrick A. Kearney, Al Weaver, 2003, SPIE Photomask Technology.

Advances in the reduction and compensation of film stress in high-reflectance multilayer coatings for extreme-ultraviolet lithography

Claude Montcalm, Paul B. Mirkarimi, 1998, Advanced Lithography.

Defect insensitive 100 J/cm2 multilayer mirror coating process

Regina Soufli, Christopher J. Stolz, Paul B. Mirkarimi, 2013, Laser Damage.

Optical and multilayer design for the first Kirkpatrick-Baez optics for x-ray diagnostic at NIF

Todd A. Decker, Tom Pardini, Paul B. Mirkarimi, 2013, Optics & Photonics - Optical Engineering + Applications.