Eric Y. Chin

Variability aware timing models at the standard cell level

Andrew R. Neureuther, Cooper S. Levy, Eric Y. Chin, 2010, Advanced Lithography.

Variability aware interconnect timing models for double patterning

Andrew R. Neureuther, Eric Y. Chin, 2009, Advanced Lithography.

Prediction of interconnect delay variations using pattern matching

Andrew R. Neureuther, Juliet Holwill, Eric Y. Chin, 2007, SPIE Advanced Lithography.

Design Trade-offs of a 6 T FinFET SRAM Cell in the Presence of Variations

Borivoje Nikolic, Mohan Dunga, Eric Y. Chin, 2007 .

Modeling Optical Lithography Physics

Eric Y. Chin, Marshal A. Miller, L. Wang, 2010 .