Se-Hyuk Im

High Volume Semiconductor Manufacturing Using Nanoimprint Lithography

Keita Sakai, Mitsuru Hiura, Osamu Morimoto, 2020, 2020 4th IEEE Electron Devices Technology & Manufacturing Conference (EDTM).

Topography and flatness induced overlay distortion correction using resist drop pattern compensation in nanoimprint lithography systems

Mitsuru Hiura, Ecron Thompson, Jin Choi, 2019, Advanced Lithography.

Patterning, mask life, throughput and overlay improvements for high volume semiconductor manufacturing using nanoimprint lithography

Keita Sakai, Osamu Morimoto, Yukio Takabayashi, 2019, Photomask Technology.

Addressing nanoimprint lithography mix and match overlay using drop pattern compensation

Anshuman Cherala, Ecron Thompson, Se-Hyuk Im, 2020 .