Henry N. Chapman

Direct comparison of EUV and visible-light interferometries

Jeffrey Bokor, Patrick P. Naulleau, Kenneth A. Goldberg, 1999, Advanced Lithography.

Sample injection for pulsed x-ray sources

Francesco Stellato, Mengning Liang, Karol Nass, 2011, Optics + Optoelectronics.

Implications of the focal beam profile in serial femtosecond crystallography

Henry N. Chapman, Peter Metcalf, Lorenzo Galli, 2015, Europe Optics + Optoelectronics.

Ultra-high accuracy optical testing: creating diffraction-limited short-wavelength optical systems

Anton Barty, Regina Soufli, Erik H. Anderson, 2005, SPIE Optics + Photonics.

Multilayer optics for an extreme-ultraviolet lithography tool with 70-nm resolution

Regina Soufli, Stanley Mrowka, Claude Montcalm, 2001, SPIE Advanced Lithography.