Kye Hyun Baek

发表

Implementation of a robust virtual metrology for plasma etching through effective variable selection and recursive update technology

Thomas F. Edgar, Chonghun Han, Han-Ku Cho, 2014 .

Multiple input multiple output controller design to match chamber performance in plasma etching for semiconductor manufacturing

Chonghun Han, Ho Kyu Kang, Thomas F. Edgar, 2013 .

Design of optical emission spectroscopy based plasma parameter controller for real-time advanced equipment control

Chonghun Han, Hyun-Joon Roh, Kye Hyun Baek, 2017, Comput. Chem. Eng..

Improvement of principal component analysis modeling for plasma etch processes through discrete wavelet transform and automatic variable selection

Chonghun Han, Kye Hyun Baek, Daegeun Ha, 2016, Comput. Chem. Eng..

Design of boil-off CO 2 re-liquefaction processes for a large-scale liquid CO 2 transport ship

Chonghun Han, Yeongbeom Lee, Sanggyu Lee, 2017 .

Process and chamber health monitoring of plasma enhanced ti deposition process through high performance VI-probe

Seong Woon Choi, Yongjin Kim, Woosung Han, 2007, 2007 International Symposium on Semiconductor Manufacturing.

Multi-mode operation of principal component analysis with k-nearest neighbor algorithm to monitor compressors for liquefied natural gas mixed refrigerant processes

Chul-Jin Lee, Chonghun Han, Kye Hyun Baek, 2017, Comput. Chem. Eng..

Particle Reduction in W-CMP Process through Optimizing Post Cleaner

Han-Ku Cho, Jae Chang Lee, Kye Hyun Baek, 2012 .

An effective procedure for sensor variable selection and utilization in plasma etching for semiconductor manufacturing

Chonghun Han, Thomas F. Edgar, Kiwook Song, 2014, Comput. Chem. Eng..

Systematic method to optimize conditioning process through real time plasma monitoring

Kye Hyun Baek, Joo Tae Moon, Chang Jin Kang, 2005, ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005..

Role of O2 in Aluminum Etching with BCl3/Cl2/O2 Plasma in High Density Plasma Reactor

Won Gyu Lee, Kye Hyun Baek, W. Lee, 1999 .

Study of plasma charging-induced white pixel defect increase in CMOS active pixel sensor

Han-Ku Cho, Joo-Tae Moon, Chang-Jin Kang, 2007 .

Chamber maintenance and fault detection technique for a gate etch process via self-excited electron resonance spectroscopy

Han-Ku Cho, Chang-Jin Kang, Young-Jae Jung, 2005 .