Moitreyee Mukherjee-Roy

Defocusing image to pattern contact holes using attenuated phase shift masks

Sohan Singh Mehta, Navab Singh, Moitreyee Mukherjee-Roy, 2003, Microelectron. J..

Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning

Rakesh Kumar, Sohan Singh Mehta, Navab Singh, 2004, Microelectron. J..

A new approach for eliminating unwanted patterns in attenuated phase shift masks

Sohan Singh Mehta, Navab Singh, Moitreyee Mukherjee-Roy, 2003, Microelectron. J..

Resist pattern peeling assessment in DUV chemically amplified resist

Rakesh Kumar, Sohan Singh Mehta, Navab Singh, 2004, Microelectron. J..

A Dual BARC method for Lithography and Etch for Dual Damascene with Low K

Ganesh S. Samudra, Moitreyee Mukherjee-Roy, Vladimir N. Bliznetsov, 2003 .

Challenges in Etching of OSG Low- K Materials for Dual-Damascene Metallization

Moitreyee Mukherjee-Roy, Leong Yew Wing, Vladimir N. Bliznetsov, 2002 .