B. T. Chan

发表

Dry development rinse process for ultimate resolution improvement via pattern collapse mitigation

Geert Vandenberghe, Danilo De Simone, Arjun Singh, 2015, Advanced Lithography.

Directed self-assembly process integration: Fin patterning approaches and challenges

Frieda Van Roey, Roel Gronheid, Paul Nealey, 2014, Advanced Lithography.

Buried Power Rail Integration With FinFETs for Ultimate CMOS Scaling

Christopher J. Wilson, B. T. Chan, H. Mertens, 2020, IEEE Transactions on Electron Devices.

Invited) Vertical Nanowire FET Integration and Device Aspects

Nadine Collaert, Aaron Thean, Tsvetan Ivanov, 2016 .

Advanced processing steps for high efficiency solar cells based on EFG material

J. John, B. T. Chan, G. Beaucarne, 2008, 2008 33rd IEEE Photovoltaic Specialists Conference.

On the effects of hydrogenation of thin film polycrystalline silicon: A key factor to improve heterojunction solar cells

B. T. Chan, A. Fejfar, I. Gordon, 2014 .

Reducing surface reflectivity below 10% by nano-features on random pyramid textured silicon wafers

B. T. Chan, J. John, J. Poortmans, 2009 .

Defect Mitigation in Area‐Selective Atomic Layer Deposition of Ruthenium on Titanium Nitride/Dielectric Nanopatterns

B. T. Chan, H. Hody, A. Franquet, 2019, Advanced Materials Interfaces.

Characterization of Patterned Porous Low-k Dielectrics: Surface Sealing and Residue Removal by Wet Processing/Cleaning

B. T. Chan, T. Conard, S. Gendt, 2016 .

Insight into Selective Surface Reactions of Dimethylamino-trimethylsilane for Area-Selective Deposition of Metal, Nitride, and Oxide

B. T. Chan, A. Delabie, J. Soethoudt, 2020 .

Low-Frequency Noise Behavior of nMOSFETs with Different Al2O3 Capping Layer Thickness and TiN Gate

B. T. Chan, D. Mocuta, B. Govoreanu, 2019 .

Readying Directed Self-Assembly for Patterning in Semi-Conductor Manufacturing

Roel Gronheid, Joost Bekaert, Boon Teik Chan, 2013 .

Hexagonal hole array patterning for memory applications

B. T. Chan, R. Gronheid, Arjun Singh, 2015 .

DSA as a complementary lithography technique for contact hole patterning

B. T. Chan, G. Vandenberghe, R. Gronheid, 2013 .

An Integrated Silicon MOS Single-Electron Transistor Charge Sensor for Spin-Based Quantum Information Processing

B. T. Chan, B. Govoreanu, I. Radu, 2020, IEEE Electron Device Letters.

Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

Roel Gronheid, Boon Teik Chan, Jan Doise, 2017 .

Dual brush process for selective surface modification in graphoepitaxy directed self-assembly

Roel Gronheid, Boon Teik Chan, Jan Doise, 2017, Advanced Lithography.

Implementation of surface energy modification in graphoepitaxy directed self-assembly for hole multiplication

Yi Cao, Roel Gronheid, Joost Bekaert, 2015 .

Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon

B. T. Chan, A. Delabie, G. Parsons, 2018 .

Impact of sequential infiltration synthesis on pattern fidelity of DSA lines

Roel Gronheid, Arjun Singh, Boon Teik Chan, 2015, Advanced Lithography.

Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Lieve Van Look, Yi Cao, Hari Pathangi, 2014, Advanced Lithography.

Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly

Roel Gronheid, Joost Bekaert, Boon Teik Chan, 2017 .

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Yi Cao, Hari Pathangi, Roel Gronheid, 2015 .

Defect mitigation and root cause studies in IMEC's 14nm half-pitch chemo-epitaxy DSA flow

Lieve Van Look, Yi Cao, Hari Pathangi, 2015, Advanced Lithography.

Improved cost-effectiveness of the block co-polymer anneal process for DSA

Hari Pathangi, Roel Gronheid, Boon Teik Chan, 2016, SPIE Advanced Lithography.

Development of solar cells on RST-ribbons

B. T. Chan, C. Belouet, E. Jolivet, 2009, 2009 34th IEEE Photovoltaic Specialists Conference (PVSC).

Evolution of roughness during the pattern transfer of high-chi, 10nm half-pitch, silicon-containing block copolymer structures

Geert Vandenberghe, Chris A. Mack, C. Grant Willson, 2018, Advanced Lithography.

Vertical nanowire FET integration and device aspects

B. T. Chan, Z. Tao, E. Rosseel, 2016 .

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer.

B. T. Chan, A. Knoll, H. Wolf, 2018, ACS nano.

Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Silicon Nitride with inhibition on Amorphous Carbon

B. T. Chan, A. Delabie, G. Parsons, 2018 .

CFET SRAM DTCO, Interconnect Guideline, and Benchmark for CMOS Scaling

B. T. Chan, J. Ryckaert, F. Catthoor, 2023, IEEE Transactions on Electron Devices.

DTCO of sequential and monolithic CFET SRAM

B. T. Chan, F. Catthoor, P. Weckx, 2023, Advanced Lithography.

(Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs

Geert Hellings, Eddy Simoen, Niamh Waldron, 2017 .

Opportunities and challenges for DSA in logic and memory

Geert Vandenberghe, Julien Ryckaert, Arjun Singh, 2016 .

Integration of a templated directed self-assembly-based hole shrink in a short loop via chain

Roel Gronheid, Nancy Heylen, Boon Teik Chan, 2016 .

Rectification of EUV-patterned contact holes using directed self-assembly

Roel Gronheid, Arjun Singh, Kathleen Nafus, 2013, Advanced Lithography.

Progress in directed self-assembly hole shrink applications

Roel Gronheid, Boon Teik Chan, Nadia Vandenbroeck, 2013, Advanced Lithography.